| Operational Status | ● Online | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Description |
This Oxford Plasmalab System 100 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) system. It is used to deposit low-stress thin films with excellent step coverage on a variety of samples at low temperatures (generally 200 - 300 O C). These thin films include:
|
|||||||||||||||
| Location | FabLab |
CVD Tunnel
|
|||||||||||||||
| Manufacturer |
Oxford Instruments PlasmaLab System 100 Link |
|||||||||||||||
| Staff Contact |
 Thomas Loughrantcl@umd.edu 301-405-3642 |
|||||||||||||||
| Rates | UMD $75/hr External Non-profit / University $116/hr Small Commercial / MTECH $158/hr Large Commercial $220/hr No Charge $0/hr |
|||||||||||||||
| Reservations |
|
|||||||||||||||
| Logs |
|
|||||||||||||||
| SOPs |
|
|||||||||||||||
| Manuals | You must have lab permissions to view the manuals. Please login to view manuals or contact the lab staff to obtain permissions. |
|||||||||||||||
| Recipes | PECVD RecipesHigh Quality SiON PECVD.tif (96.05 KB)High Qulaity SiO2 PECVD.tif (78.22 KB) SiNx PECVD.tif (102.04 KB) TEOS based SiO2 PECVD.tif (100.2 KB) a-Si PECVD.tif (74.76 KB) a-Si_PECVD.txt (845 B) |
