Comments on: SPIE Microlithography Conference, Post Script #2 https://lithoguru.com/life/?p=19 Musings of a Gentleman Scientist Mon, 30 Nov -001 00:00:00 +0000 hourly 1 https://wordpress.org/?v=6.4.5 By: Mark Mason https://lithoguru.com/life/?p=19#comment-22 Mon, 30 Nov -0001 00:00:00 +0000 #comment-22 EUV seems to be another example where Intel has lead the industry down a litho rathole (157 before EUV). What’s next, "Intel announces neutrino lithography as next NGL?"

]]> By: Scott Ashkenaz https://lithoguru.com/life/?p=19#comment-23 Mon, 30 Nov -0001 00:00:00 +0000 #comment-23 > Double printing, where two larger pitch patterns as interspersed to create a smaller pitch pattern, is getting serious attention. Of course, nobody likes to even think about doubling the cost of an already expensive critical lithography step. And the overlay challenges are formidable.

This may result in a splitting of litho paths; there is no way that the foundries (or more accurately, their customers) will be able to afford it. Like high-priced oil, the cost will provide an umbrella for the development of alternate technologies, such as EBDW.

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