Comments on: SPIE Microlithography Conference, Post Script

By: Chris Sallee

Chris Sallee — Mon, 30 Nov -0001 00:00:00 +0000

I’ve become hooked on your daily diary. Will you every expound upon what you think SPIE this year meant in terms of trends and drivers? Last year’s ideas that were firmly planted 6 feet down this year? Changes in probabilities of success for EUV as a production technology at/below 32nm, for example? Your thoughts on who is winning the technology horse race among the stepper companies? Resist companies? Mask companies? Others? You stuck it to Intel fairly well. They’re not your only target are they?

By: Qi-De Qian

Qi-De Qian — Mon, 30 Nov -0001 00:00:00 +0000

Hi Chris,

It is a great pleasure to see your web site up and running.

SPIE conference has been a forum to "let hundred flowers bloom". It is better than, IMHO, "the other" litho conference, the 3beams, as some of us may still remember.

So, is it dry or wet in Austin? Has our industry leader shrunk the gate to the noise level, therefore it doesn't matter wet or dry? A noise level only EUV could overcome?

By: Scott Ashkenaz

Scott Ashkenaz — Mon, 30 Nov -0001 00:00:00 +0000

Chris, do you plan to put an RSS feed on this? It would make it soooo much easier to follow.

By: Mark Mason

Mark Mason — Mon, 30 Nov -0001 00:00:00 +0000

Ooohh — RSS. Or even better, how about a PodCast?

By: Mark Mason

Mark Mason — Mon, 30 Nov -0001 00:00:00 +0000

Three years ago at this conference (SPIE ML), in 2003, you (noted lithographer and Gentleman Scientist) hailed the end of the semiconductor industry “as we know it.” You argued that the days of non-linear growth and exponential improvements in technology were coming to a close, and speculated that retirement was near for many. Well, you got the retirement part right (self-fulfilling prophecy?). What about the end of the world (er, ah, I mean industry)?