https://lithoguru.com/life/?p=174 Musings of a Gentleman Scientist Mon, 30 Nov -001 00:00:00 +0000 hourly 1 https://wordpress.org/?v=6.4.5 https://lithoguru.com/life/?p=174#comment-12418 Mon, 30 Nov -0001 00:00:00 +0000 #comment-12418 The Texas Two-Tone resist was termed the most important development in the last 10 years in a comment by Will Conley of Freescale Semiconductor, a recognized industry expert. It does seem more likely to be used in production than resists that require two developers to print both tones: one aqueous and one an organic solvent.

]]> https://lithoguru.com/life/?p=174#comment-12434 Mon, 30 Nov -0001 00:00:00 +0000 #comment-12434 The key idea of Holistic Lithography, according to Bert Koek, senior vice president of the applications products group at ASML, is integrating computational lithography, wafer printing, and process control to enable shrink towards 32nm using 193nm water immersion exposure tools.

]]> https://lithoguru.com/life/?p=174#comment-12449 Mon, 30 Nov -0001 00:00:00 +0000 #comment-12449 I find it very interesting to see various players in the industry slowly getting behind this basic double-patterning strategy: Designs are restricted to essentially one-dimensional features of a single pitch on a grid. The first patterning step uses 193i with sidewall-spacer pitch doubling that can get the final pitch down to around 38 – 40 nm.

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